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LightSmyth光柵
Lightsmyth成立于2000年，致力于納米產(chǎn)品的開發(fā)創(chuàng)新。2007年，lightsmyth的高性能衍射光柵在光通信、國防和生物科技市場中獲得市場認(rèn)可。直到今天，lightsmyth所提供的超過100多種優(yōu)化的光柵產(chǎn)品廣泛應(yīng)用于各種領(lǐng)域。lightsmyth產(chǎn)品和創(chuàng)新是圍繞全息衍射原理，通過結(jié)合先進的半導(dǎo)體模型工具如深紫外線（DUV）步進電機制造中的應(yīng)用/掃描儀進行生產(chǎn)制造。
Lightsmyth是納米光子學(xué)創(chuàng)新產(chǎn)品開發(fā)的領(lǐng)導(dǎo)者。創(chuàng)新包括超高效率的偏振不敏感光柵的電信產(chǎn)品線，硅基板等超低散射高質(zhì)量功能先進的衍射光柵。
LightSmyth熔融石英和高強度介電薄膜生產(chǎn)透射光柵，采用業(yè)界當(dāng)前先進投影光刻基板和和反應(yīng)性離子蝕刻技術(shù)。這種高保真半導(dǎo)體制造方法使用專有衍射光柵設(shè)計，實現(xiàn)效率精確接近100％，線間距控制到百萬分之一。綜合量產(chǎn)制造的成本效益考慮，沒有其他的光柵技術(shù)能夠達(dá)到lightsmyth這種程度的性能。正因為對設(shè)計和技術(shù)的不懈追求，LightSmyth的光柵具有很寬的波長范圍，并且可以調(diào)整入射角進一步得到更高性能。
高寬帶高衍射效率
低偏振靈敏度
功能卓越，均勻刻線槽
僅采用熔融石英和高強度電介質(zhì)，無聚合物
非常高的環(huán)境穩(wěn)定性，通過Tellcordia質(zhì)量認(rèn)證
每個光柵均為母光柵：低散射，無重影
大的通光區(qū)域：直徑可達(dá)140毫米
非常有競爭力的價格
嚴(yán)格的質(zhì)量控制：通過ISO9001:2008質(zhì)量體系認(rèn)證
高級透射光柵（電信）-光通信高效率偏振無關(guān)透射光柵
透射光柵是使透射光形成光譜的光柵。LightSmyth高性價比透射光柵采用業(yè)界先進的設(shè)計和精確的光刻晶圓級制造技術(shù)，光學(xué)性能與低成本不斷刷新紀(jì)錄，為您的光學(xué)系統(tǒng)提供強大的競爭優(yōu)勢。高衍射效率，低PDL和極具競爭力的價格為您提供世界上高性價比的透射光柵。
Description |
T-940-C |
T-966-C |
T-940-L |
T-940-CL |
Units |
Groove Density |
940.07 |
966.2 |
940.07 |
940.07 |
grooves/mm |
Operational Wavelength Range |
1526-1566
(C band) |
1526-1566
(C band) |
1570-1610
(L band) |
1526-1610
(C+L band) |
nm |
Optimum Incidence Angle |
46.5 |
48.3 |
48.4 |
47.5 |
degrees |
Groove Density Uniformity |
0.001 |
0.001 |
0.001 |
0.001 |
grooves/mm |
Diffraction Efficiency (s- and p-polarization) |
> 94 |
> 94 |
> 94 |
> 92 |
% |
Polarization Dependent Loss |
< 0.2 |
< 0.2 |
< 0.2 |
< 0.25 |
dB |
Spectral Non-Uniformity |
< 0.15 |
< 0.15 |
< 0.15 |
< 0.25 |
dB |
Spatial PDL Non-Uniformity |
< 0.1 |
< 0.1 |
< 0.1 |
< 0.1 |
dB |
| Type |
Substrate Size |
Clear Aperture |
Part Number |
| C band, 940 grooves/mm |
24 × 9 mm |
23 × 8 mm |
T-940C-2409-94 |
| |
24 × 14 mm |
23 × 13 mm |
T-940C-2414-94 |
| C band, 966 grooves/mm |
16 × 10 mm |
15 × 9 mm |
T-966C-1610-94 |
| |
27 × 10 mm |
26 × 9 mm |
T-966-C-2710-94 |
| |
24 × 16.4 mm |
23 × 15.4 mm |
T-966C-24x16.4-94 |
| L band, 940 grooves/mm |
27.4 × 10 mm |
26.4 × 9 mm |
T-940L-2710-94 |
| C+L band, 940 grooves/mm |
27.4 × 10 mm |
26.4 × 9 mm |
T-940CL-2710-92 |
高級反射光柵（電信）
LightSmyth使用電信級偏振分集光學(xué)設(shè)計和激光頻率穩(wěn)定技術(shù)生產(chǎn)高效率反射光柵。采用投影光刻和反應(yīng)性離子蝕刻技術(shù)在硅單晶基底上金屬化，以實現(xiàn)單極化的高效性能。每個光柵均設(shè)計為母光柵，而不是復(fù)制光柵，達(dá)到低散射光和持久性能目標(biāo)。
- 單極化超高效率
- 采用高強度介電材料，不使用聚合物
- 每個光柵均是超低散射母光柵
- 高競爭力價格，Telcordia質(zhì)量認(rèn)證
Line Density |
Size |
Performance Grade |
Part Number |
1200 lines/mm |
12.5 × 12.5 mm |
High |
SLG-C12-1212A-Au-HP |
|
25 × 25 mm |
High |
SLG-C12-2525A-Au-HP |
標(biāo)準(zhǔn)反射光柵
- 每塊光柵都是高性能的母板，不使用聚合物
- 超低成本（低于復(fù)制光柵）
- 免費復(fù)制/缺陷檢測核定；超低散射
- 高強度單晶硅基板
- 近似于銅的熱導(dǎo)率
- 高硼硅玻璃，減少熱膨脹
Line Density
(lines/mm) |
λPE 1 |
Size |
Part number |
1200 |
580 nm (s), 1 μm to 1.55 μm (p) |
12.5 mm × 12.5 mm |
SLG-C12-1212A-Al |
1200 |
580 nm (s), 1 μm to 1.55 μm (p) |
25 mm × 25 mm |
SLG-C12-2525A-Al |
1200 |
580 nm (s), 1 μm to 1.55 μm (p) |
50 mm × 30 mm 2 |
SLG-C12-5030A-Al |
1800 |
390 nm (s), 660 nm to 1.0 μm (p) |
20 mm × 9 mm 2 |
SLG-C18-2009A-Al |
2400 |
300 nm (s),430 nm to 780 nm(p) |
12.5 mm × 12.5 mm |
SLG-C24-1212A-Al |
3600 |
240 nm (s), 480 nm (p) |
12.5 mm × 12.5 mm |
SLG-C36-1212A-Al |
X射線和深紫外光柵列表
Line Density
(lines/mm) |
Groove depth |
Size |
Part number |
7200 |
50 nm |
12.5 mm × 12.5 mm |
SLG-C72-1212A-Au |
7200 |
50 nm |
25 mm × 25 mm |
SLG-C72-2525A-Au |
7200 |
50 nm |
50 mm × 50 mm |
SLG-C72-5050A-Au |
脈沖壓縮透射光柵
脈沖壓縮光柵重要的性質(zhì)是衍射效率高和低的波前變形，面向光柵的多通使用要求。激光脈沖壓縮傳輸光柵基于LightSmyth破紀(jì)錄的透射光柵平臺。優(yōu)化的線性P-偏振衍射效率在94％以上，它可以讓我們的客戶小化系統(tǒng)光學(xué)損耗，尤其面向高能激光器。
優(yōu)點
- 對指定的偏振有特殊的衍射效率
- 寬帶和低角度的敏感性特殊設(shè)計
- 超拋光石英基底使波前變形小化
- 使用熔融石英和高可靠介電材料
- 不使用聚合物或有機材料
- 每個光柵均為超低散射母光柵
Description |
LSFSG-1000 |
T-1200-850 |
T-1500-875 |
T-1850-915s |
T-1850-970s |
T-1600-976s |
T-1600-1060s |
Units |
Line Density |
1000 |
1208.46 |
1503.76 |
1851.851 |
1851.851 |
1600 |
1600 |
l/mm |
Operational Wavelength Range |
1040±20 |
850±20 |
875±20 |
915±10 |
970±10 |
976±10 |
1060±20 |
nm |
Optimum Angle of Incidence |
31.0 ± 1 |
30.7 ±1 |
41.0 ±1 |
57.9±1 |
63.9±1 |
51.3±1 |
58.0±1 |
° |
Line Density Uniformity (within grating) |
0.001 |
0.001 |
0.001 |
0.001 |
0.001 |
0.001 |
0.001 |
l/mm |
Optimal Polarization |
any |
any |
any |
S- |
S- |
S- |
S- |
nm |
Diffraction Efficiency |
> 94 |
> 94 |
> 94 |
> 93 |
> 93 |
> 94 |
> 94 |
% |
| Line Density |
Wavelength, Polarization |
Substrate Size 1, 2 |
Part Number |
| 1000 lines/mm |
1040 nm, any |
31.8 × 12.3 mm |
LSFSG-1000-3212-94 |
|
|
31.8 × 24.8 mm |
LSFSG-1000-3225-94 |
|
|
130.0 × 12.3 mm |
LSFSG-1000-13012-94 |
|
|
130.0 × 20 mm |
LSFSG-1000-13020-94 |
|
|
up to 135 mm diameter |
LSFSG-1000-cust |
| 1200 lines/mm |
850 nm, any |
21.65 × 15.9 mm |
T-1200-850-2216-94 |
|
|
130.0 × 12.3 mm |
T-1200-850-13012-94 |
|
|
130.0 × 20 mm |
T-1200-850-13020-94 |
|
|
up to 135 mm diameter |
T-1200-850-cust |
| 1500 lines/mm |
875 nm, any |
24.8 × 15.9 mm |
T-1500-875-2516-94 |
|
|
130.0 × 12.3 mm |
T-1500-875-13012-94 |
|
|
130.0 × 20 mm |
T-1500-875-13020-94 |
|
|
up to 135 mm diameter |
T-1500-875-cust |
| 1850 lines/mm |
915 nm, S |
31.8 × 10.0 mm |
T-1850-915s-3210-93 |
|
|
31.8 × 20.2 mm |
T-1850-915s-3220-93 |
|
|
130.0 × 10.0 mm |
T-1850-915s-13010-93 |
|
|
130.0 × 20.2 mm |
T-1850-915s-13020-93 |
|
|
up to 135 mm diameter |
T-1850-915s-cust |
| 1850 lines/mm |
970 nm, S |
31.8 × 10.0 mm |
T-1850-970s-3210-93 |
|
|
31.8 × 20.2 mm |
T-1850-970s-3220-93 |
|
|
130.0 × 10.0 mm |
T-1850-970s-13010-93 |
|
|
130.0 × 20.2 mm |
T-1850-970s-13020-93 |
|
|
up to 135 mm diameter |
T-1850-970s-cust |
| 1600 lines/mm |
976 nm, S |
31.8 × 12.3 mm |
T-1600-976s-3212-94 |
|
|
40 × 10 mm |
T-1600-976s-4010-94 |
|
|
31.8 × 24.8 mm |
T-1600-976s-3225-94 |
|
|
130.0 × 12.3 mm |
T-1600-976s-13012-94 |
|
|
130.0 × 20 mm |
T-1600-976s-13020-94 |
|
|
up to 135 mm diameter |
T-1600-976s-cust |
| 1600 lines/mm |
1060 nm, S |
31.8 × 12.3 mm |
T-1600-1060s-3212-94 |
|
|
31.8 × 24.8 mm |
T-1600-1060s-3225-94 |
|
|
130.0 × 10 mm |
T-1600-1060s-13010-94 |
|
|
130.0 × 20 mm |
T-1600-1060s-13020-94 |
|
|
up to 135 mm diameter |
T-1600-1060s-cust |
Nanopatterned Silicon Stamps
LightSmyth提供種類繁多的納米制造單結(jié)晶硅基底，為納米光子學(xué)研究行業(yè)和學(xué)術(shù)機構(gòu)提供了一個低成本應(yīng)用的方案�？捎糜诟鞣N應(yīng)用在光學(xué)、光子學(xué)、生物學(xué)、化學(xué)、物理學(xué)（如中子散射）、高分子材料研究、納米、微流體和其他的基板。如果需要的話，可以在基板進行金屬或介電材料鍍膜。大多數(shù)截面型材的表面特征略呈梯形，有直線平行的臺地和溝槽以及格狀結(jié)構(gòu)�？商峁┒喾N特征尺寸和溝槽深度�；宓腟EM圖像，可以在裝運之前進行更新的確認(rèn)。
| Description |
Value |
| Clear Aperture (CA) |
0.5 mm from substrate edge (the pattern may extend to the edge of the substrate) |
|
| Substrate Thickness |
0.675 ± 0.050 mm |
| Surface Quality in CA |
P/N ends with "-P": 60/40 scratch/dig: 0.06 mm maximum scratch width, 0.4 mm maximum dig diameter. up to 20/10 specification may be provided at a premium |
| Surface Quality in CA |
P/N ends with "-S": Discounted grade due to surface quality. Has at least 80% of usable area. Up to 80/100 scratch/dig/particles and irregular substrate shape may present |
| Surface Quality outside of CA |
no requirements |
| Material |
Single crystal silicon, reactive ion etch |
線性納米結(jié)構(gòu)
| Period |
Groove depth |
Duty cycle 1 |
Line width 2 |
Size 3 |
Part number |
| 139 nm |
50 nm |
50% |
69.5 nm |
12.5×12.5×0.7 mm |
SNS-C72-1212-50-P |
| 139 nm |
50 nm |
50% |
69.5 nm |
25×25×0.7 mm |
SNS-C72-2525-50-P |
| 278 nm |
110 nm |
50% |
139 nm |
12.5×12.5×0.7 mm |
SNS-C36-1212-110-S |
| 416.6 nm |
110 nm |
50% |
208 nm |
12.5×12.5×0.7 mm |
SNS-C24-1212-110-P |
| 500 nm |
multiple |
44% |
220 nm |
8×8.3×0.7 mm |
SNS-C20-0808-xxx-D45-P |
| 500 nm |
multiple |
60% |
300 nm |
8×8.3×0.7 mm |
SNS-C20-0808-xxx-D60-P |
| 555.5 nm |
110 nm |
50% |
278 nm |
20×9×0.7 mm |
SNS-C18-2009-110-D50-P |
| 555.5 nm |
140 nm |
50% |
278 nm |
20×9×0.7 mm |
SNS-C18-2009-140-D50-P |
| 555.5 nm |
110 nm |
29% |
158 nm |
20×9×0.7 mm |
SNS-C18-2009-110-D29-P |
| 555.5 nm |
140 nm |
29% |
158 nm |
20×9×0.7 mm |
SNS-C18-2009-140-D29-P |
| 600 nm |
multiple |
43% |
260 nm |
8×8.3×0.7 mm |
SNS-C16.7-0808-xxx-D45-P |
| 600 nm |
multiple |
55% |
330 nm |
8×8.3×0.7 mm |
SNS-C16.7-0808-xxx-D55-P |
| 606 nm |
190 nm |
50% |
303 nm |
29×12×0.7 mm |
SNS-C16.5-2912-190-P |
| 606 nm |
190 nm |
50% |
303 nm |
29×12×0.7 mm |
SNS-C16.5-2912-190-S |
| 606 nm |
190 nm |
50% |
303 nm |
29×24.2×0.7 mm |
SNS-C16.5-2924-190-P |
| 675 nm |
170 nm |
32% |
218 nm |
24×10×0.7 mm |
SNS-C14.8-2410-170-P |
| 675 nm |
170 nm |
32% |
218 nm |
24×30.4×0.7 mm |
SNS-C14.8-2430-170-P |
| 700 nm |
multiple |
47% |
330 nm |
8×8.3×0.7 mm |
SNS-C14.3-0808-xxx-D45-P |
| 700 nm |
multiple |
55% |
375 nm |
8×8.3×0.7 mm |
SNS-C14.3-0808-xxx-D55-P |
| 833.3 nm |
200 nm |
50% |
416 nm |
12.5×12.5×0.7 mm |
SNS-C12-1212-200-P |
| 833.3 nm |
200 nm |
50% |
416 nm |
25×25×0.7 mm |
SNS-C12-2525-200-P |
2維納米模板
| Period |
Lattice type |
Groove depth |
Feature width |
Size |
Part number |
| 500 nm |
rect post |
multiple |
135 nm |
8×8.3×0.7 mm |
S2D-24B1-0808-xxx-P |
| 500 nm |
rect post |
multiple |
210 nm |
8×8.3×0.7mm |
S2D-18B1-0808-xxx-P |
| 600 nm |
rect post |
multiple |
195 nm |
8×8.3×0.7mm |
S2D-24B2-0808-xxx-P |
| 600 nm |
rect post |
multiple |
275 nm |
8×8.3×0.7mm |
S2D-18B2-0808-xxx-P |
| 700 nm |
rect post |
multiple |
260 nm |
8×8.3×0.7mm |
S2D-24B3-0808-xxx-P |
| 700 nm |
rect post |
multiple |
350 nm |
8×8.3×0.7mm |
S2D-18B3-0808-xxx-P |
| 500 nm |
hex post |
multiple |
165 nm |
8×8.3×0.7mm |
S2D-18C1-0808-xxx-P |
| 600 nm |
hex post |
multiple |
165 nm |
8×8.3×0.7mm |
S2D-24C2-0808-xxx-P |
| 600 nm |
hex post |
multiple |
240 nm |
8×8.3×0.7mm |
S2D-18C2-0808-xxx-P |
| 700 nm |
hex post |
multiple |
220 nm |
8×8.3×0.7mm |
S2D-24C3-0808-xxx-P |
| 700 nm |
hex post |
multiple |
290 nm |
8×8.3×0.7mm |
S2D-18C3-0808-xxx-P |
| 600 nm |
hex hole |
multiple |
180 nm |
8×8.3×0.7mm |
S2D-24D2-0808-xxx-P |
| 700 nm |
hex hole |
multiple |
200 nm |
8×8.3×0.7mm |
S2D-18D3-0808-xxx-P |
| 700 nm |
hex hole |
multiple |
290 nm |
8×8.3×0.7mm |
S2D-24D3-0808-xxx-P |
|
線陣CCD光纖光譜儀
